Sputtering target - sintered - indium tin oxide (sputtering target production - sintered - indium tin oxide)

Emissions generated by the activity within the product supply chain as described in ecoinvent v3.10. This is delivering the service of 'sputtering target sintered indium tin oxide'. Sputtering target is a physical vapor deposition mechanism that is used to deposit a thin film of a substance in a given surface of an object. This dataset represents the sputtering target of indium tin oxide (ITO) bound to a copper backplate with dimensions of 610mm x 350mm. The service includes material inputs production infrastructure and energy consumption. This coating service with ITO can be applied to substrates such as glass and plastic to add favourable electronic and optical properties in applications like screens displays sensors and energy efficient windows and in different industries such as automotive military and for research and development. The cut-off classification is allocatable product. The activity type is ordinary transforming activity. The reference product amount is 1.