Sputtering target - sintered - indium tin oxide (sputtering target production)

The activity generating the emissions is sputtering target production, sintered, indium tin oxide. The reference product is sputtering target, sintered, indium tin oxide. This is delivering the service of sputtering target, sintered, indium tin oxide. Sputtering target is a physical vapor deposition mechanism that is used to deposit a thin film of a substance in a given surface of an object. This dataset represents the sputtering target of indium tin oxide (ITO) bound to a copper backplate with dimensions of 610mm x 350mm. The service includes material inputs, production infrastructure and energy consumption. This coating service with ITO can be applied to substrates such as glass and plastic to add favourable electronic and optical properties in applications like screens, displays, sensors and energy efficient windows, and in different industries such as automotive, military and for research and development. The reference product amount is 1. The cut-off classification is allocatable product. The activity type is ordinary ordinary transforming activity. Please refer to the ecoinvent documentation here for full details: https://ecoquery.ecoinvent.org/3.11/cutoff/dataset/725/documentation.